Float Zone Furnace FZ350

Crystal Growth System FZ 350 for Float Zone Process

Specially design for laboratories, institutes and as testing unit for solar silicon.
The floating zone crystal growth system FZ 350 can be used for cleaning processes under vacuum and for single crystal growth under inert gas (also dopant gases) up to pressure of 1,2 bars absolute.
Its technical design (dimensioning, power) enables the use of rods with length of 320 mm and a maximum diameter of 2".

FZ350 Float Zone Installations